Synlett 2023; 34(19): 2346-2350
DOI: 10.1055/a-2159-4847
letter

Trimethylsilyl Azide Promoted Shono Oxidation of N,N-Dialkyl Amides

Authors

  • Wenlin Luo

    a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
  • Ruixing Zhang

    a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
  • Qi Xu

    b   Nursing School of Nanchang University, Nanchang, 330031, P. R. of China
  • Shengyu Zheng

    c   Institute for Advanced Study, Nanchang University, Nanchang, 330031, P. R. of China
  • Junpeng Yang

    a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
  • Meixia Liu

    a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
  • Shengmei Guo

    a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China
  • Hu Cai

    a   Department of Chemistry, Nanchang University, Nanchang, 330031, P. R. of China

We thank the National Science Foundation of China (21861024) for financial support.


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Abstract

An alkoxylation of N,N-dialkyl amides by the Shono reaction has been developed that offers a simple and efficient way to access N-adjacent-carbon-substituted amides. TMSN3 plays an essential role in this transformation and permits the reaction to proceed with a broad substrate scope under mild conditions. This reaction proceeds at a lower current compared with the classical method and it affords the products in up to 91% yield. A possible mechanism is proposed based on control experiments.

Supporting Information



Publication History

Received: 24 June 2023

Accepted after revision: 23 August 2023

Accepted Manuscript online:
23 August 2023

Article published online:
04 October 2023

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