Subscribe to RSS
Please copy the URL and add it into your RSS Feed Reader.
          
          https://www.thieme-connect.de/rss/thieme/en/10.1055-s-00000083.xml
        Synlett 1992; 1992(4): 360-362
DOI: 10.1055/s-1992-22015
   DOI: 10.1055/s-1992-22015
letter
© Georg Thieme Verlag, Rüdigerstr. 14, 70469 Stuttgart, Germany.  All rights reserved.
      This journal, including all individual contributions and  illustrations published
      therein, is legally protected by copyright for the duration of  the copyright period.
      Any use, exploitation or commercialization outside the narrow  limits set by copyright
      legislation, without the publisher's consent, is illegal and  liable to criminal prosecution.
      This applies in particular to photostat reproduction,  copying, cyclostyling, mimeographing
      or duplication of any kind, translating,  preparation of microfilms, and electronic
      data processing and storage.Fluorine and Trifluoromethyl Substituted Anilines: Site Selective Metalation and Electrophilic Substitution
Further Information
            
               
                  
            
         
      
   Publication History
Publication Date:
08 March 2002 (online)
 PDF Download(opens in new window)  Permissions and Reprints(opens in new window) All articles of this category(opens in new window)
      
When treated with tert-butyllithium in tetrahydrofuran at -50 °C, N-BOC (tert-butoxycarbonyt) protected fluoroanilines and trifluoromethylanilines undergo metalation at the nitrogenadjacent position. If, however, the nitrogen carries two alkyl or trimethylsilyl groups as substituents and highly polar metalating reagents such as butyllithium activated by N,N,N′N″,N″-pentamethyldiethylenetriamine (PMDTA) or potassium tert-butoxide are employed, the fluoroaniline derivatives are preferentially deprotonated next to the halogen atom.
 
    