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New Precursor for Difluorocarbenes
F. Wang, W. Zhang, J. Zhu, H. Li, K.-W. Huang*, J. Hu*
Shanghai Institute of Organic Chemistry, P. R. of China and King Abdullah University of Science and Technology, Thuwal, Kingdom of Saudi Arabia
18 March 2011 (online)
Developing new fluorination methods is of great interest in areas such as material science and pharmaceuticals. However, the existing fluoroalkylation reagents are usually generated from hazardous materials or under harsh conditions. The authors demonstrated that (chlorodifluoromethyl)trimethylsilane (TMSCF2Cl) can be used as the precursor for difluorocarbene (:CF2) under neutral and relatively mild conditions.